Atomic layer deposition of BiFeO3 thin films using β-diketonates and H2O

Journal of Physical Chemistry C

Volumn 117, Issue 46, 2013, Pages 24579-24585

  Zhang, Feng ^a   Sun, Guosheng ^a   Zhao, Wanshun ^a   Wang, Lei ^a   Zheng, Liu ^a   Liu, Shengbei ^a   Liu, Bin ^a   Dong, Lin ^a   Liu, Xingfang ^a   Yan, Guoguo ^a   Tian, Lixin ^a   Zeng, Yiping ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH FERRITES; CHEMICAL ABSORPTION; CHEMICAL MECHANISM; DEPOSITION TECHNIQUE; DEVICE APPLICATION; PIEZORESPONSE FORCE MICROSCOPY; POLARIZATION PROPERTIES; RHOMBOHEDRAL PHASE;

BISMUTH; BISMUTH COMPOUNDS; DEPOSITION; FILM PREPARATION; PHOTOELECTRONS; SCANNING PROBE MICROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84888597879     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4080652     Document Type: Article

References (32)

1. 3 Multiferroic Thin Film Heterostructures Science 2003, 299, 1719-1722
2. Martin, L. W.; Chu, Y. H.; Ramesh, R. Advances in the Growth and Characterization of Magnetic, Ferroelectric, and Multiferroic Oxide Thin Films Mater. Sci. Eng., R 2010, 68, 89-133
3. 3 Epitaxial Thin Films Jpn. J. Appl. Phys. 2 2006, 45, L187-L189
4. Catalan, G.; Scott, J. F. Physics and Applications of Bismuth Ferrite Adv. Mater. 2009, 21, 2463-2485
5. 3 Thin Films Appl. Phys. Lett. 2002, 80, 1628-1630
6. 3 Thin Films Electrochem. Solid State 2005, 8, F55-F57
7. 3 Thin Films Grown by Sputtering Appl. Phys. Lett. 2006, 88, 242904
8. 3 Films for Memory Applications Appl. Phys. Lett. 2005, 87, 102903
9. 3 Thin Films Grown by Metal Organic Chemical Vapor Deposition Jpn. J. Appl. Phys. 2 2005, 44, L1231-L1233
10. 3 (001) J. Vac. Sci. Technol., B 2007, 25 (3) 1049-1052
11. Puurunen, R. L. Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process J. Appl. Phys. 2005, 97, 121301
12. George, S. M. Atomic Layer Deposition: An Overview Chem. Rev. 2010, 110, 111-131
13. X on 4H-SiC for Metal-Ferroelectric-Insulator- Semiconductor Diodes J. Appl. Phys. 2011, 109, 124109
14. Choi, J. H.; Zhang, F.; Perng, Y. C.; Chang, J. P. Tailoring the Composition of Lead Zirconate Titanate by Atomic Layer Deposition J. Vac. Sci. Technol., B 2013, 31, 012207
15. 3 Ultrathin Films by Atomic Layer Deposition J. Phys. Chem. C 2012, 116, 3449-3456
16. 3 Thin Films by Atomic Layer Deposition Thin Solid Films 2005, 488, 74-81
17. 3 Using Ferrocene and Ozone J. Phys. Chem. C 2011, 115, 4333-4339
18. 3 Precursor Chem. Mater. 2004, 16 (16) 3176-3183
19. Funakubo, H.; Ishikawa, K.; Watanabe, T.; Mitsuya, M.; Nukaga, N. Preparation of Bismuth Layer-Structured Ferroelectric Thin Films by MOCVD and Their Characterization Adv. Mater. Opt. Electron. 2000, 10 (3-5) 193-200
20. 3 Chem. Vap. Deposition 2001, 7 (5) 205-209
21. 2OMe)]Infinity Inorg. Chem. 1990, 29 (3) 358-360
22. Roeder, J. F.; Hendrix, B. C.; Hintermaier, F.; Desrochers, D. A.; Baum, T. H.; Bhandari, G.; Chappuis, M.; Van Buskirk, P. C.; Dehm, C.; Fritsch, E. Ferroelectric Strontium Bismuth Tantalate Thin Films Deposited by Metalorganic Chemical Vapour Deposition (MOCVD) J. Eur. Ceram. Soc. 1999, 19 (6-7) 1463-1466
23. Hatanpaa, T.; Vehkamaki, M.; Ritala, M.; Leskela, M. Study of Bismuth Alkoxides as Possible Precursors for ALD Dalton Trans. 2010, 39 (13) 3219-3226
24. Rooth, M.; Johansson, A.; Kukli, K.; Aarik, J.; Boman, M.; Harsta, A. Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes Using Ferrocene and Oxygen as Precursors Chem. Vap. Deposition 2008, 14 (3-4) 67-70
25. 3 Atomic Layer Deposition on Polymers Chem. Mater. 2005, 17, 5625-5634
26. Puurunen, R. L. Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model Chem. Vap. Deposition 2003, 9 (5) 249-257
27. Ylilammi, M. Monolayer Thickness in Atomic Layer Deposition Thin Solid Films 1996, 279 (1-2) 124-130
28. Van, T. T.; Chang, J. P. Surface Reaction Kinetics of Metal Beta-Diketonate Precursors with O Radicals in Radical-Enhanced Atomic Layer Deposition of Metal Oxides Appl. Surf. Sci. 2005, 246 (1-3) 250-261
29. 3 and Its Valence Band Structure Solid State Sci. 2010, 12, 1803-1808
30. 3 Thin Films Fabricated by Chemical Solution Deposition J. Appl. Phys. 2006, 100, 064102
31. 3 Films: Domain Structure and Polarization Dynamics Phase Transitions 2006, 79 (12) 991-1017
32. 3 Films Nanotechnology 2011, 22 (25) 254030