Development of fixed abrasive chemical mechanical polishing process for glass disk substrates

International Journal of Advanced Manufacturing Technology

Volumn 68, Issue 5-8, 2013, Pages 993-1000

  Tian, Y B ^a   Zhong, Z W ^b   Lai, S T ^b   Ang, Y J ^a  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Chemical mechanical polishing; Fixed abrasive polishing; Glass disk substrate; Hard disk driver; Material removal rate; Surface roughness

Indexed keywords

ABRASIVES; GLASS; HEAT RESISTANCE; POLISHING; SUBSTRATES; SURFACE ROUGHNESS; TOPOGRAPHY;

CHEMICAL MECHANICAL POLISHING(CMP); CHEMICAL-MECHANICAL POLISHING PROCESS; DISK DRIVERS; FIXED ABRASIVES; GLASS DISKS; LOOSE ABRASIVE LAPPING; MATERIAL REMOVAL MECHANISMS; MATERIAL REMOVAL RATE;

CHEMICAL MECHANICAL POLISHING;

EID: 84888312305     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-013-4890-4     Document Type: Article

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