Effects of slurry components on the surface characteristics when chemical mechanical polishing NiP/Al substrate

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 400-406

  Lin, Shih Chieh ^a   Huang, Huang Chieh ^a   Hocheng, Hong ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Aluminium oxide; Planarization; Silicon oxide; Surface roughness

Indexed keywords

ALUMINA; CHEMICAL MECHANICAL POLISHING; FAST FOURIER TRANSFORMS; NICKEL COMPOUNDS; PH EFFECTS; SILICA; SURFACE ROUGHNESS;

ABRASIVE CONCENTRATION; OXIDIZERS; PLANARIZATION; SURFACE WAVINESS;

SLURRIES;

EID: 18844375043     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.046     Document Type: Article

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