Patterning of hafnia and titania via gas-phase soft lithography combined with atomic layer deposition

Applied Surface Science

Volumn 285, Issue PARTB, 2013, Pages 220-225

  Notley, Shannon M ^a   Fogden, Andrew ^b  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Atomic layer deposition; Condensation; Mineral oxide; Soft lithography

Indexed keywords

ATOMIC LAYER DEPOSITION; CONDENSATION; DEPOSITS; HAFNIUM OXIDES; METALS; POLYDIMETHYLSILOXANE; PROCESSING; SILICA; SILICONES; TITANIUM DIOXIDE;

COMPLEX GEOMETRIES; CONFORMAL CONTACTS; LATERAL RESOLUTION; METAL OXIDE PRECURSORS; MINERAL OXIDES; POLYDIMETHYLSILOXANE STAMPS; PROCESSING TEMPERATURE; SOFT LITHOGRAPHY;

ATOMS;

EID: 84887100761     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.08.040     Document Type: Article

References (30)

1. Y. Xia, and G.M. Whitesides Annu. Rev. Mater. Sci. 28 1998 153
2. J.A. Rogers, and R.G. Nuzzo Mater. Today 8 2008 50 56
3. Y. Xia, and G.M. Whitesides Angew. Chem. Int. Ed. 37 1998 550
4. Y. Xia, J.A. Rogers, K.E. Paul, and G.M. Whitesides Chem. Rev. 99 1999 1823 1848
5. B.D. Gates, Q. Xu, M. Stewart, D. Ryan, C.G. Wilson, and Whitesides G G.M. Chem. Rev. 105 2005 1171 1196
6. R.G. Nuzzo, and D.L. Allara J. Am. Chem. Soc. 105 1983 4481 4483
7. J.C. Love, L.A. Estroff, J.K. Kriebel, R.G. Nuzzo, and G.M. Whitesides Chem. Rev. 105 2005 1103 1169
8. M. Kind, and C. Woll Prog. Surf. Sci. 84 2009 230 278
9. A. Ulman Chem. Rev. 96 1996 1533
10. E.P. Plueddemann Silane Coupling Agents 1991 Plenum Press New York/London
11. S.M. George, A. Ott, and J.W. Klaus J. Phys. Chem. 100 1996 13121
12. O. Sneh, R.B. Clark-Phelps, A.R. Londergan, J. Winkler, and T.E. Seidel Thin Solid Films 402 2002 248
13. M. Leskela, and M. Ritala Thin Solid Films 409 2002 138
14. A. Sinha, D.W. Hess, and C.L. Henderson J. Vac. Sci. Technol. B 24 2006 2523
15. A. Sinha, D.W. Hess, and C.L. Henderson J. Vac. Sci. Technol. B 25 2007 1721
16. X. Jiang, and S.F. Bent J. Phys. Chem. C 113 2009 17613 17625
17. E.K. Seo, J.W. Lee, H.M. Sung-Suh, and M.M. Sung Chem. Mater. 16 2004 1878 1883
18. A. Sinha, D.W. Hess, and C.L. Henderson Progr. Biomed. Opt. Imaging Proc. SPIE 5753 2005 476 486
19. X. Jiang, R. Chen, and S.F. Bent Surf. Coat. Technol. 201 2007 8799
20. R. Chen, H. Kim, P.C. McIntyre, and S.F. Bent Appl. Phys. Lett. 84 2004 4017 4019
21. X. Jiang, and S.F. Bent ECS Trans. 3 2007 249 259
22. K.J. Park, J.M. Doub, T. Gougousi, and G.N. Parsons Appl. Phys. Lett. 86 2005 1 3
23. X. Jiang, and S.F. Bent J. Electrochem. Soc. 154 2007 D648 D656
24. C.A. Wilson, R.K. Grubbs, and S.M. George Chem. Mater. 17 2005 5625 5634
25. G.K. Hyde, G. Scarel, and G.N. Parsons Langmuir 26 2010 2250 2258
26. R.B. Walsh, A. Nelson, W.M. Skinner, D.F. Parsons, and V.S.J. Craig J. Phys. Chem. C 116 2012 7838 7847
27. S.M. Notley J. Phys. Chem. B 116 2012 6059 6065
28. G. Triani, J.A. Campbell, P.J. Evans, J. Davis, B.A. Latella, and R.P. Burford Thin Solid Films 518 2010 3182 3189
29. R.B. Walsh, S.C. Howard, A. Nelson, W.M. Skinner, G. Liu, and V.S.J. Craig Chem. Lett. 41 2012 1247 1249
30. R. de la Rica, A. Baldi, E. Mendoza, A. San Paulo, A. Llobera, and C. Fernandez-Sanchez Small 4 2008 1076 1079