Shear-induced structures and thickening in fumed silica slurries

Langmuir

Volumn 29, Issue 42, 2013, Pages 12915-12923

  Crawford, Nathan C ^a   Williams, S Kim R ^a   Boldridge, David ^b   Liberatore, Matthew W ^a  

^a Department of Geology and Geological Engineering   (United States)

^b CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; CHEMICAL MECHANICAL POLISHING; CHLORINE COMPOUNDS; IONIC STRENGTH; LIGHT SCATTERING; MICROELECTRONICS; MICROMETERS; POLISHING; POTASSIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; SHEAR DEFORMATION; SILICA; VISCOSITY;

CHEMICAL MECHANICAL POLISHING(CMP); IN-SITU OBSERVATIONS; MICRO-ELECTRONIC DEVICES; RHEOLOGICAL CHARACTERIZATION; SEMICONDUCTOR INDUSTRY; SHEAR-INDUCED STRUCTURES; SHEAR-THICKENING BEHAVIOR; SMALL-ANGLE LIGHT SCATTERING;

SHEAR FLOW;

EID: 84886631632     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la402631p     Document Type: Article

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