Shear thickening and shear-induced agglomeration of chemical mechanical polishing slurries using electrolytes

Rheologica Acta

Volumn 52, Issue 5, 2013, Pages 499-513

  Crawford, Nathan C ^a   Yohe, Benjamin ^a   Kim, S ^a   Williams, R ^a   Boldridge, David ^b   Liberatore, Matthew W ^a  

^a Department of Geology and Geological Engineering   (United States)

^b CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

Chemical mechanical polishing; Electrolyte; Fumed silica; High shear; Rheology; Shear thickening

Indexed keywords

EID: 84878908936     PISSN: 00354511     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00397-013-0711-9     Document Type: Article

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