Shear thickening of chemical mechanical polishing slurries under high shear

Rheologica Acta

Volumn 51, Issue 7, 2012, Pages 637-647

  Crawford, Nathan C ^a   Williams, S Kim R ^a   Boldridge, David ^b   Liberatore, Matthew W ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

^b CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

Chemical mechanical polishing; Fumed silica; High shear; Rheology; Shear thickening

Indexed keywords

EID: 84862190642     PISSN: 00354511     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00397-012-0636-8     Document Type: Article

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