News from the M in CMP - Viscosity of CMP slurries, a constant?

Materials Research Society Symposium - Proceedings

Volumn 767, Issue , 2003, Pages 47-56

  Lortz, W ^a   Menzel, F ^a   Brandes, R ^b   Klaessig, F ^b   Knothe, T ^b   Shibasaki, T ^c  

^a EVONIK INDUSTRIES AG   (Germany)

^b Degussa Corporation   (United States)

^c Nippon Aerosil Co   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; NON NEWTONIAN FLOW; SLURRIES; VISCOSITY; WSI CIRCUITS;

PLATE SYSTEM;

CHEMICAL MECHANICAL POLISHING;

EID: 0242353973     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-767-f1.7     Document Type: Conference Paper

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11. www.aca.fi