Comparison of the structural and optical properties of ZnO thin films deposited by three different methods for optoelectronic applications

Superlattices and Microstructures

Volumn 64, Issue , 2013, Pages 283-293

  Singh, Shaivalini ^a   Chakrabarti, P ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b MOTILAL NEHRU NATIONAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Raman spectroscopy; RF sputtering; Sol gel; Thermal oxidation; X ray photoelectron spectroscopy (XPS); ZnO thin films

Indexed keywords

ELECTRICAL TRANSPORT PROPERTIES; OPTICAL AND ELECTRICAL PROPERTIES; OPTOELECTRONIC APPLICATIONS; RF-SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; THERMAL OXIDATION; THREE DIFFERENT TECHNIQUES; ZNO THIN FILM;

ELECTRIC PROPERTIES; OPTICAL FILMS; OXIDATION; PHOTOELECTRONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; SOL-GEL PROCESS; SOL-GELS; TRANSPORT PROPERTIES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

METALLIC FILMS;

EID: 84886497753     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2013.09.031     Document Type: Article

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