High-quality crystallinity controlled ALD TiO2 for waveguiding applications

Optics Letters

Volumn 38, Issue 20, 2013, Pages 3980-3983

  Alasaarela, Tapani ^a   Karvonen, Lasse ^a   Jussila, Henri ^a   Säynätjoki, Antti ^a   Mehravar, Soroush ^b   Norwood, Robert A ^b   Peyghambarian, Nasser ^b   Kieu, Khanh ^b   Tittonen, Ilkka ^a   Lipsanen, Harri ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURES; NANOCRYSTALLINE TITANIUM DIOXIDE; OPTICAL APPLICATIONS; PRISM COUPLING METHOD; THIRD-HARMONIC GENERATION MICROSCOPY; THIRD-ORDER OPTICAL NONLINEARITIES; TRIMETHYL ALUMINUMS; WAVEGUIDE MATERIALS;

ALUMINUM CHLORIDE; DEPOSITION; GRAIN SIZE AND SHAPE; NONLINEAR OPTICS; TITANIUM DIOXIDE; WAVEGUIDES;

ATOMIC LAYER DEPOSITION;

EID: 84885449031     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.38.003980     Document Type: Article

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