Optical waveguides in TiO2 formed by He ion implantation

Optics Express

Volumn 20, Issue 6, 2012, Pages 6712-6719

  Bi, Zhuan Fang ^a   Wang, Lei ^a   Liu, Xiu Hong ^a   Zhang, Shao Mei ^a   Dong, Ming Ming ^b   Zhao, Quan Zhong ^b   Wu, Xiang Long ^c   Wang, Ke Ming ^a  

^a SHANDONG UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^c Shandong Huaguang Optoelectronics Co Ltd   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; OXIDE MINERALS; PLANAR WAVEGUIDES; RIDGE WAVEGUIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; TITANIUM DIOXIDE;

CALCULATION METHODS; DAMAGE PROFILES; FLUENCES; GUIDED MODES; HE ION IMPLANTATION; HIGH ENERGY; ION BEAM ETCHING; ION IMPLANTED; ION-IMPLANTED WAVEGUIDES; LOW ENERGIES; MICRO-FABRICATION TECHNOLOGY; NEAR-FIELD INTENSITY; PLANAR OPTICAL WAVEGUIDES; PRISM COUPLER; REFRACTIVE INDEX PROFILES; ROOM TEMPERATURE; RUTHERFORD BACK-SCATTERING; RUTILE TIO; TIO;

ION IMPLANTATION;

HEAVY ION; HELIUM; ION; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; RADIATION EXPOSURE; REFRACTOMETRY; SURFACE PLASMON RESONANCE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HEAVY IONS; HELIUM; IONS; REFRACTOMETRY; SURFACE PLASMON RESONANCE; TITANIUM;

EID: 84858951722     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.006712     Document Type: Article

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