SCOPUS 정보 검색 플랫폼

Volumn 577, Issue , 2013, Pages 261-268

Effect of post-deposition annealing on the growth of nanocrystalline TiO2 thin films and elastic anisotropy of rutile phase at different temperatures

(4) Sarma, Bimal K a,b Pal, Arup R a Bailung, Heremba a Chutia, Joyanti a

a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY (India)

b GAUHATI UNIVERSITY (India)

Author keywords

Anisotropy; Elasticity; Thin films; Vapor deposition; X ray diffraction

Indexed keywords

ANISOTROPY; ANNEALING; CRYSTALLOGRAPHY; DEPOSITION; ELASTIC MODULI; ELASTICITY; NANOCRYSTALS; OXIDE MINERALS; TITANIUM DIOXIDE; VAPOR DEPOSITION; X RAY DIFFRACTION;

ANNEALING TEMPERATURES; CRYSTALLOGRAPHIC DIRECTIONS; DC REACTIVE MAGNETRON SPUTTERING; NANO-CRYSTALLINE TIO; NANOCRYSTALLINE RUTILE; POLYCRYSTALLINE AGGREGATES; POST DEPOSITION ANNEALING; UNIT CELL PARAMETERS;

THIN FILMS;

EID: 84884370253 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2013.05.137 Document Type: Article

Times cited : (20)

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