In-situ X-ray diffraction studies of time and thickness dependence of crystallization of amorphous TiO2 thin films and stress evolution

Thin Solid Films

Volumn 519, Issue 5, 2010, Pages 1649-1654

  Kuzel R ^a   Nichtova L ^a   Matej Z ^a   Musil, J ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; ANNEALING TIME; CRYSTALLINITIES; CRYSTALLIZATION PROCESS; CRYSTALLIZATION RATES; DIFFERENT THICKNESS; IN-SITU X-RAY DIFFRACTION; JOHNSON-MEHL-AVRAMI-KOLMOGOROV; NANOCRYSTALLINE FILMS; PATTERN FITTING; PHOTOCATALYTIC ACTIVITIES; POST-ANNEALED SAMPLES; PREFERRED ORIENTATIONS; STRESS EVOLUTION; STRONG CORRELATION; THICKNESS DEPENDENCE; THICKNESS OF THE FILM; TIME DEPENDENCE; TITANIUM DIOXIDE FILMS;

CRYSTALLIZATION; DIFFRACTION; ISOTHERMAL ANNEALING; MICROSTRUCTURE; NANOCRYSTALLINE POWDERS; TENSILE STRESS; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 78649802776     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.122     Document Type: Conference Paper

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