Effect of counter-ion and solvent on the morphology and barrier layer properties of nanoporous/nanotubular TiO2 films grown by anodization in fluoride containing media

Journal of the Electrochemical Society

Volumn 160, Issue 6, 2013, Pages

  Acevedo Peña, Próspero ^a   Valdez Pérez, Donato ^b   González, Ignacio ^a  

^a DEPARTAMENTO DE QUÍMICA   (Mexico)

^b UNIVERSIDAD AUTÓNOMA DE SAN LUIS POTOSÍ   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

AGGRESSIVE CHEMICALS; ANODIC FILM GROWTH; BARRIER LAYERS; FILM RESISTANCE; FILM ROUGHNESS; FILM TOPOGRAPHY; FORMATION POTENTIAL; NANO-POROUS TIO;

ANODIC OXIDATION; CHEMICAL ATTACK; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FLUORINE COMPOUNDS; GROWTH RATE; IONS; PORE SIZE; TITANIUM DIOXIDE;

TOPOGRAPHY;

EID: 84884330526     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.083306jes     Document Type: Article

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