Modification of growth parameters of Ti anodic films by fluoride ion insertion

Journal of Solid State Electrochemistry

Volumn 16, Issue 8, 2012, Pages 2709-2715

  Acevedo Peña, Próspero ^a   González, Ignacio ^a  

^a DEPARTAMENTO DE QUÍMICA   (Mexico)

Author keywords

Anodic films; EIS; Fluoride ion insertion; Surface charge approach model

Indexed keywords

ANODIC FILMS; EIS; EXPERIMENTAL DATA; FLUORIDE ION; GROWTH PARAMETERS; HF CONCENTRATION; ION DIFFUSION COEFFICIENT; JUMP DISTANCE; LATTICE STRUCTURES; LOW FREQUENCY; OXIDE GROWTH; POTENTIOSTATICS; PSEUDOCAPACITANCE;

DIFFUSION; ELECTRIC FIELDS; ELECTRIC PROPERTIES; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FLUORINE; IONS; METALLIC FILMS;

FILM GROWTH;

EID: 84865458749     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-012-1685-8     Document Type: Article

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