Electrodissolution of Ti and p-Si in acidic fluoride media: Formation ratio of oxide layers from electrochemical impedance spectroscopy

Journal of Electroanalytical Chemistry

Volumn 482, Issue 2, 2000, Pages 202-210

  Frateur, Isabelle ^a   Cattarin, Sandro ^a   Musiani, Marco ^a   Tribollet, Bernard ^b  

^a CNR   (Italy)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; COMPOSITION EFFECTS; DISSOLUTION; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTROLYTIC POLISHING; HYDROFLUORIC ACID; PH EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SPECTROSCOPY; TITANIUM DIOXIDE;

ELECTRODISSOLUTION;

ELECTROCHEMICAL ELECTRODES;

EID: 0033902694     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(00)00050-4     Document Type: Article

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