Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates

Electrochimica Acta

Volumn 51, Issue 6, 2005, Pages 1099-1107

  Huang, Y Z ^a   Blackwood, D J ^b  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Anodic oxide film growth; EIS and XPS; Sweep rate; Titanium

Indexed keywords

ANODES; CHARACTERIZATION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); FILM GROWTH; METALLIC FILMS; SODIUM CHLORIDE; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ANODIC OXIDE FILM GROWTH; EIS AND XPS; ELECTROCHEMICAL REACTIONS; SWEEP RATE;

TITANIUM OXIDES;

EID: 27744523789     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.05.051     Document Type: Article

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