Influence of the HCIO4 concentration over the morphology and growth of TiO2 anodic porous films formed in 5 mM HF/xM HCIO 4 (0.05 M ≤x≤ 1M)

ECS Transactions

Volumn 36, Issue 1, 2011, Pages 257-265

  Acevedo Peña, Próspero ^a   Gonzalez I ^a  

^a DEPARTAMENTO DE QUÍMICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; ELECTROCHEMISTRY; FLUORINE COMPOUNDS; MORPHOLOGY; OXIDE MINERALS; TITANIUM DIOXIDE;

BARRIER LAYER THICKNESS; CHRONOAMPEROGRAMS; FILM RESISTANCE; HIGH FREQUENCY COMPONENTS; HIGH POTENTIAL; PERCHLORIC ACIDS; TI OXIDE FILMS; VOLTAMMETRIC BEHAVIORS;

OXIDE FILMS;

EID: 84857393294     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3660619     Document Type: Conference Paper

References (13)

1. J.A. Peñafiel Castro, R. Quintero-Torres, N.R. de Tacconi, K. Rajeshwar and W. Chanmanee. J. Electrochem. Soc., 158, D84 (2011).
2. P. Roy, S. Berger and P. Schmuki, Agnew Chem Int Ed, 50, 2904 (2011) .
3. Z. Su and W. Zhou, J. Mater. Chem., 21, 8955 (2011).
4. L. Yin, S. Ji, G. Liu, G. Xu and C. Ye, Electrochem. Commun. 13, 454 (2011).
5. M. Bojinov, Electrochim. Acta, 42, 3489 (1997).
6. I. Frateur, S. Cattarin, M. Musiani, B. Tribollet, J. Electroanal. Chem., 482, 202 (2002).
7. S. Sapra, H. Li, Z. Wang and I.I. Suni, J. Electrochem. Soc., 152, B193 (2005).
8. B. Tzvetkov, M. Bojinov, A. Girginov and N. Pébère, Electrochim. Acta, 52, 7724 (2007).
9. V. Karastoyanov, M. Bojinov, Mater. Chem. Phys., 112, 702 (2008).
10. P. Acevedo-Peña, I. González, G. Vázquez and J. Manríquez, Quim. Nova, 34, 390 (2011).
11. H. Omidvar, S. Goodarzi, A. Seif and A.R. Azadmehr, Superlatt. Microstruct., 50, 26 (2011).
12. D.-S. Kong, Langmuir, 26, 4880 (2010).
13. P. Acevedo-Peña, G. Vázquez, D. Laverde, J.E. Pedraza-Rosas, I. González, J. Solid State Electrochem., 14, 757 (2010).