Programmable metallization cells based on amorphous La 0.79Sr0.21MnO3 thin films for memory applications

Journal of Alloys and Compounds

Volumn 580, Issue , 2013, Pages 354-357

  Liu, Dongqing ^a   Wang, Nannan ^a   Wang, Guang ^a   Shao, Zhengzheng ^a   Zhu, Xuan ^a   Zhang, Chaoyang ^a   Cheng, Haifeng ^a  

^a NATIONAL UNIVERSITY OF DEFENSE TECHNOLOGY   (China)

Author keywords

Amorphous thin film; Programmable metallization cell (PMC); Resistive switching

Indexed keywords

AMORPHOUS FILMS; CELLS; CYTOLOGY; MAGNETRON SPUTTERING; MANGANESE OXIDE; METALLIZING; NONVOLATILE STORAGE; SILVER; SOLID ELECTROLYTES; SWITCHING SYSTEMS;

AMORPHOUS THIN FILMS; CONDUCTION MECHANISM; IMPEDANCE SPECTROSCOPY; MEMORY APPLICATIONS; NON-VOLATILE MEMORY APPLICATION; PROGRAMMABLE METALLIZATION CELLS; RADIO FREQUENCY MAGNETRON SPUTTERING; RESISTIVE SWITCHING;

THIN FILMS;

EID: 84884252820     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.06.095     Document Type: Article

References (20)

1. R. Waser, M. Aono, Nat. Mater. 6 (2007) 833.
2. M.N. Kozicki, P. Mira, M. Mitkova, IEEE Trans. Nanotechnol. 4 (2005) 331.
3. D. Kamalanathan, U. Russo, D. Ielmini, M.N. Kozicki, IEEE Electr. Dev. Lett. 30 (2009) 553.
4. U. Russo, D. Kamalanathan, D. Ielmini, A.L. Lacaita, M.N. Kozicki, IEEE Trans. Electr. Dev. 56 (2009) 1040.
5. J.Q. Huang, L.P. Shi, E.G. Yeo, K.J. Yi, R. Zhao, IEEE Electr. Dev. Lett. 33 (2012) 98.
6. Z. Wang, P.B. Griffin, J. McVittie, S. Wong, P.C. McIntyre, Y. Nishi, IEEE Electr. Dev. Lett. 28 (2007) 14.
7. W. Ming, L. Hangbing, L. Qi, L. Yingtao, X. Zhongguang, L. Shibing, X. Hongwei, Z. Kangwei, L. Xiaoyu, S. Haitao, Y. Xiaoyi, L. Ming, IEEE Electr. Dev. Lett. 33 (2012) 1556.
8. A. Urushibara, Y. Moritomo, T. Arima, A. Asamitsu, G. Kido, Y. Tokura, Phys. Rev. B 51 (1995) 14103.
9. X. Chen, N. Wu, J. Strozier, A. Ignatiev, Appl. Phys. Lett. 89 (2006) 063507.
10. C. Moreno, C. Munuera, S. Valencia, F. Kronast, X. Obradors, C. Ocal, Nano Lett. 10 (2010) 3828.
11. Y.W. Xie, J.R. Sun, D.J. Wang, S. Liang, B.G. Shen, J. Appl. Phys. 100 (2006) 033704.
12. D.Q. Liu, N.N. Wang, G. Wang, Z.Z. Shao, X. Zhu, C.Y. Zhang, H.F. Cheng, Appl. Phys. Lett. 102 (2013) 134105.
13. A. Sawa, Mater. Today 11 (2008) 28.
14. K.M. Kim, B.J. Choi, Y.C. Shin, S. Choi, C.S. Hwang, Appl. Phys. Lett. 91 (2007) 012907.
15. J.M. Luo, S.P. Lin, Y. Zheng, B. Wang, Appl. Phys. Lett. 101 (2012) 062902.
16. F. El Kamel, P. Gonon, C. Vallee, V. Jousseaume, H. Grampeix, Appl. Phys. Lett. 98 (2011) 023504.
17. S.H. Ouyang, C.C. Wang, G.Z. Liu, M. He, K.J. Jin, Z.M. Dang, H.B. Lu, Sci. China Ser. G-Phys. Mech. Astron. 51 (2008) 232.
18. R. Waser, R. Dittmann, G. Staikov, K. Szot, Adv. Mater. 21 (2009) 2632.
19. S.G. Choi, H.-S. Lee, H. Choi, S.-W. Chung, H.-H. Park, Thin Solid Films (2012).
20. M.A. Ramirez, A.Z. Simoes, A.A. Felix, R. Tararam, E. Longo, J.A. Varela, J. Alloys Comp. 509 (2011) 9930.