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Volumn 230, Issue , 2013, Pages 130-136

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Author keywords

Composition; Metal nitrides; MOCVD; Precursors; Thin films

Indexed keywords

COMPLEMENTARY TECHNIQUES; METAL NITRIDES; METAL ORGANIC CHEMICAL VAPOUR DEPOSITIONS; NUCLEAR REACTION ANALYSIS; PRECURSORS; RUTHERFORD BACKSCATTERING SPECTROMETRY; SINGLE-SOURCE PRECURSOR; TRANSITION METAL NITRIDES;

EID: 84881481526     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.024     Document Type: Article
Times cited : (21)

References (44)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.