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Volumn 202, Issue 10, 2008, Pages 2169-2175
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Thermal stability of tungsten nitride films deposited by reactive magnetron sputtering
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Author keywords
Magnetron sputtering; Optical properties; Structural; TGA and DTA analysis; Tungsten nitride
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Indexed keywords
ACTIVATION ENERGY;
CRYSTALLIZATION;
ELECTRIC CONDUCTIVITY;
INORGANIC COATINGS;
NITRIDES;
OPTICAL PROPERTIES;
OXIDATION;
REACTIVE SPUTTERING;
THERMODYNAMIC STABILITY;
OXIDATION KINETICS;
REACTIVE MAGNETRON SPUTTERING;
TUNGSTEN NITRIDE;
MAGNETRON SPUTTERING;
ACTIVATION ENERGY;
CRYSTALLIZATION;
ELECTRIC CONDUCTIVITY;
INORGANIC COATINGS;
MAGNETRON SPUTTERING;
NITRIDES;
OPTICAL PROPERTIES;
OXIDATION;
REACTIVE SPUTTERING;
THERMODYNAMIC STABILITY;
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EID: 38049159965
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.09.005 Document Type: Article |
Times cited : (25)
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References (26)
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