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Volumn 202, Issue 10, 2008, Pages 2169-2175

Thermal stability of tungsten nitride films deposited by reactive magnetron sputtering

Author keywords

Magnetron sputtering; Optical properties; Structural; TGA and DTA analysis; Tungsten nitride

Indexed keywords

ACTIVATION ENERGY; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; INORGANIC COATINGS; NITRIDES; OPTICAL PROPERTIES; OXIDATION; REACTIVE SPUTTERING; THERMODYNAMIC STABILITY;

EID: 38049159965     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.09.005     Document Type: Article
Times cited : (25)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.