Electrochromic properties of tungsten oxide films prepared by reactive sputtering

Japanese Journal of Applied Physics

Volumn 52, Issue 5 PART 3, 2013, Pages

  Kim, Min Hong ^a   Kang, Tai Young ^a   Jung, Yu Sup ^a   Kim, Kyung Hwan ^a  

^a Gachon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; COLORATION EFFICIENCIES; ELECTROCHROMIC PROPERTIES; OXYGEN FLOW RATIOS; ROOM TEMPERATURE; SPUTTERING METHODS; TUNGSTEN OXIDE FILMS; UV/VIS SPECTROMETRY;

CYCLIC VOLTAMMETRY; OXIDE FILMS; OXYGEN; SPECTRUM ANALYSIS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 84881405868     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.05EC03     Document Type: Conference Paper

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