Influence of the mobility of Pt nanoparticles on the anisotropic etching properties of silicon

ECS Solid State Letters

Volumn 2, Issue 2, 2013, Pages

  Li, Xiaopeng ^a,b   Xiao, Yanjun ^c   Yan, Chenglin ^a   Zhou, Keya ^c   Schweizer, Stefan L ^b   Sprafke, Alexander ^b   Lee, Jung Ho ^c   Wehrspohn, Ralf B ^b,d  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^c Hanyang University   (South Korea)

^d FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER PROCESS; COST-EFFECTIVE METHODS; ELECTROKINETIC MODELS; METAL-ASSISTED CHEMICAL ETCHING; PRECISE CONTROL; PT NANOPARTICLES; SCHOTTKY BARRIER HEIGHTS; SILICON MICROMACHINING;

CATALYSTS; METAL NANOPARTICLES; PLATINUM;

SILICON;

EID: 84880557814     PISSN: 21628742     EISSN: 21628750     Source Type: Journal    
DOI: 10.1149/2.010302ssl     Document Type: Article

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