Effect of noble metal catalyst species on the morphology of macroporous silicon formed by metal-assisted chemical etching

Electrochimica Acta

Volumn 54, Issue 22, 2009, Pages 5142-5148

  Asoh, Hidetaka ^a   Arai, Fusao ^a   Ono, Sachiko ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Colloidal crystal templating; Metal assisted chemical etching; Noble metal; Silicon

Indexed keywords

AU CATALYSTS; CHEMICAL DISSOLUTION; CHEMICAL ETCHING; COLLOIDAL CRYSTAL TEMPLATING; ETCHING RATE; MACRO POROUS SILICON; MACROPORES; METAL CATALYST; METAL THIN FILM; METAL-ASSISTED CHEMICAL ETCHING; NOBLE METAL; NOBLE METAL CATALYSTS; PD CATALYST; PORE DEPTH; SI SUBSTRATES; SILICON SURFACES; SITE SELECTIVE; STRAIGHT PORES; UNIFORM DIAMETER;

CATALYSIS; CATALYSTS; DISSOLUTION; ETCHING; METAL RECOVERY; METALS; MORPHOLOGY; PALLADIUM; PLATINUM; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS;

PRECIOUS METALS;

EID: 65749102286     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.01.050     Document Type: Article

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