Directional etching of silicon by silver nanostructures

Applied Physics Express

Volumn 4, Issue 2, 2011, Pages

  Sharma, Pradeep ^a,b,c   Wang, Yuh Lin ^a,b,c  

^a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c ACADEMIA SINICA   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE X-RAY; INTERFACE OXIDE; KEY FACTORS; NANO CHANNELS; NANOMETER OXIDES; NANOTRENCHES; SI (100) SUBSTRATE; SILVER NANOSTRUCTURES; TEM;

ETCHING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOPARTICLES; NANORODS; SILICON;

SILVER;

EID: 79951614184     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.4.025001     Document Type: Article

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