Characteristic corrosion resistance of nanocrystalline TiN films prepared by high density plasma reactive magnetron sputtering

Journal of Nanoscience and Nanotechnology

Volumn 13, Issue 7, 2013, Pages 4601-4607

  Kim, J H ^a   Kang, C G ^a   Kim, Y T ^a   Cheong, W S ^b   Song, P K ^a  

^a Pusan National University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Corrsion Resistance; Electromagnetic Field; Metal Bipolar Plate; Nanocrystalline TiN Thin Film

Indexed keywords

ELECTROCHEMICAL METHODS; HIGH DENSITY PLASMAS; METAL BIPOLAR PLATES; POTENTIODYNAMIC TESTS; PREFERRED ORIENTATIONS; REACTIVE DC MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING; TIN THIN FILMS;

ALUMINUM; ALUMINUM COATINGS; CORROSION RESISTANCE; ELECTRIC PROPERTIES; ELECTROMAGNETIC FIELDS; MAGNETRON SPUTTERING; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; PLATE METAL; SCANNING ELECTRON MICROSCOPY; SHEET RESISTANCE; TITANIUM NITRIDE; X RAY DIFFRACTION;

SUBSTRATES;

NANOMATERIAL; TITANIUM; TITANIUM NITRIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CORROSION; CRYSTALLIZATION; HEAT; MACROMOLECULE; MAGNET; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; PLASMA GAS; SURFACE PROPERTY; ULTRASTRUCTURE;

CORROSION; CRYSTALLIZATION; HOT TEMPERATURE; MACROMOLECULAR SUBSTANCES; MAGNETS; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; PLASMA GASES; SURFACE PROPERTIES; TITANIUM;

EID: 84880543591     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2013.6416     Document Type: Article

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