Nano-porous TiN thin films deposited by reactive sputtering method

International Journal of Inorganic Materials

Volumn 3, Issue 8, 2001, Pages 1193-1196

  Fang, Q ^a,c   Zhang, J Y ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

^c UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

Columnar structure; Nano porous; Reactive sputtering; TiN thin films

Indexed keywords

NITROGEN; TITANIUM DERIVATIVE; TITANIUM NITRIDE; UNCLASSIFIED DRUG;

CONFERENCE PAPER; FILM; MATERIAL STATE; NANOPARTICLE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; STRUCTURE ANALYSIS; X RAY DIFFRACTION;

EID: 0035214881     PISSN: 14666049     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1466-6049(01)00124-6     Document Type: Conference Paper

References (12)