Synthesis and properties of silicon dioxide films prepared by pulsed laser deposition using ceramic SiO 2 target

Applied Surface Science

Volumn 256, Issue 1, 2009, Pages 231-234

  He, Xiliang ^a,b   Wu, Jiehua ^a   Li, Xiaomin ^a   Gao, Xiangdong ^a   Zhao, Lili ^a   Wu, Lingnan ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Ceramic SiO 2 targets; Pulsed laser deposition; Structural and optical properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; INFRARED DEVICES; OPTICAL PROPERTIES; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SILICA; SILICON OXIDES; SINTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

OPTICAL QUALITIES; PROPERTIES OF DEPOSITED FILMS; ROOT MEAN SQUARE ROUGHNESS; SILICON DIOXIDE FILM; SOLID STATE SINTERING; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; VISIBLE NEAR-INFRARED;

OPTICAL FILMS;

EID: 70349776036     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.08.005     Document Type: Article

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