Effect of oxygen pressure on the microstructure and properties of the Al2O3-SiO2 thin films deposited by E-beam evaporation

Surface and Coatings Technology

Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3309-3313

  Huang, Hong Hsin ^a   Liu, Yuan Shing ^a   Chen, Yen Ming ^a   Huang, Ming Chih ^b   Wang, Moo Chin ^c,d  

^a CHENG SHIU UNIVERSITY   (Taiwan)

^b Yu Ta Institute of Technology and Commerce   (Taiwan)

^c NATIONAL UNITED UNIVERSITY   (Taiwan)

^d NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

Adhesion; Al2O3 SiO2 film; E Beam evaporation; Transmittance

Indexed keywords

ADHESION; ALUMINA; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; INORGANIC COATINGS; MICROSTRUCTURE; OPACITY; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICA; X RAY DIFFRACTION ANALYSIS;

ELECTRON BEAM EVAPORATION; OXYGEN PRESSURE; VISIBLE SPECTROSCOPY;

THIN FILMS;

ADHESION; ALUMINA; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; INORGANIC COATINGS; MICROSTRUCTURE; OPACITY; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 31644446673     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.07.032     Document Type: Article

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