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Journal of Applied Physics

Volumn 113, Issue 21, 2013, Pages

Reduced leakage in epitaxial BiFeO3 films following oxygen radio frequency plasma treatment

(5) Kothari, Deepti a,b Upadhyay, Sanjay K b Jariwala, C a Raole, P M a Raghavendra Reddy, V b

a INSTITUTE FOR PLASMA RESEARCH (India)

b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRUCIAL PARAMETERS; DEVICE APPLICATION; LOW TEMPERATURE PROCESSING; ORDERS OF MAGNITUDE; OXYGEN PLASMA TREATMENTS; P-E HYSTERESIS LOOPS; RADIO-FREQUENCY PLASMA TREATMENT; X RAY REFLECTIVITY;

EPITAXIAL GROWTH; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; OXYGEN; PLASMA APPLICATIONS; PULSED LASER DEPOSITION; WAVE PLASMA INTERACTIONS; X RAY DIFFRACTION;

EPITAXIAL FILMS;

EID: 84879326406 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4808461 Document Type: Article

Times cited : (6)

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