High performance of silicon nanowire-based biosensors using a high- K stacked sensing thin film

ACS Applied Materials and Interfaces

Volumn 5, Issue 11, 2013, Pages 5214-5218

  Bae, Tae Eon ^a   Jang, Hyun June ^a   Yang, Jong Heon ^b   Cho, Won Ju ^a  

^a Kwangwoon University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

biosensor; sensitivity; silicon nanowire; SiO2 HfO 2 Al2O3 (OHA); thin film

Indexed keywords

HYSTERESIS VOLTAGE; INTERFACE STATE DENSITY; PERFORMANCE OF DEVICES; SENSING PERFORMANCE; SENSITIVITY; SENSOR APPLICATIONS; SILICON NANOWIRES; SIO2/HFO 2/AL2O3 (OHA);

ALUMINUM; BIOSENSORS; HAFNIUM OXIDES; NANOWIRES; SENSORS; SILICON; THIN FILMS;

SILICON OXIDES;

ALUMINUM OXIDE; NANOWIRE; SILICON DIOXIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL MODEL; CHEMISTRY; ELECTRIC CAPACITANCE; GENETIC PROCEDURES; METHODOLOGY; PROTEIN MICROARRAY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR;

ALUMINUM OXIDE; BIOSENSING TECHNIQUES; ELECTRIC CAPACITANCE; MEMBRANES, ARTIFICIAL; MICROSCOPY, ELECTRON, SCANNING; MODELS, CHEMICAL; NANOWIRES; PROTEIN ARRAY ANALYSIS; SILICON DIOXIDE; TRANSISTORS, ELECTRONIC;

EID: 84879100357     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am401026z     Document Type: Article

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