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Volumn 389, Issue 1-3, 2011, Pages 33-37

Role of interparticle forces during stress-induced agglomeration of CMP slurries

Author keywords

Agglomeration; Chemical Mechanical Polishing; Interparticle force; Shear stress

Indexed keywords

CHEMICAL MECHANICAL POLISHING; INDICATORS (CHEMICAL); POLISHING; SHEAR STRESS; SILICA; SLURRIES;

EID: 80054082609     PISSN: 09277757     EISSN: 18734359     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2011.09.001     Document Type: Article
Times cited : (17)

References (18)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.