Computational aspects of optical lithography extension by Directed Self-Assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8683, Issue , 2013, Pages

  Lai, Kafai ^a   Liu, Chi Chun ^b   Pitera, Jed ^c   Dechene, Dan J ^a   Schepis, Anthony ^b   Abdallah, Jassem ^b   Tsai, Hsinyu ^a   Guillorn, Mike ^a   Cheng, Joy ^c   Doerk, Gregory ^c   Tjio, Melia ^c   Rettner, Charles ^c   Odesanya, Olalekan ^a   Ozlem, Melih ^d   Lafferty, Neal ^a  

^a IBM RESEARCH   (United States)

^b IBM   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d IBM Yorktown Research Center ^*

Author keywords

Compact model; Computational lithography; Directed self assembly; DSA model; Lithography optimization; Mask decomposition; Optical extension; Optical lithography; Optical proximity correction; Source mask optimization

Indexed keywords

COMPACT MODEL; COMPUTATIONAL LITHOGRAPHIES; DIRECTED SELF-ASSEMBLY; LITHOGRAPHY OPTIMIZATION; OPTICAL EXTENSION; OPTICAL PROXIMITY CORRECTIONS; SOURCE-MASK OPTIMIZATIONS;

MASKS; PHOTOLITHOGRAPHY;

SELF ASSEMBLY;

EID: 84878410403     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2012440     Document Type: Conference Paper

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