Thermal de-isolation of silicon microstructures in a plasma etching environment

Journal of Micromechanics and Microengineering

Volumn 23, Issue 2, 2013, Pages

  Lee, Yong Seok ^a   Jang, Yun Ho ^a   Kim, Yong Kweon ^a   Kim, Jung Mu ^b  

^a Seoul National University   (South Korea)

^b Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION ERRORS; HEAT SINKING; PLASMA ETCHING PROCESS; SILICON MICROSTRUCTURES; STANDARD DEVIATION; TEMPERATURE RISE; THEORETICAL AND EXPERIMENTAL; THIN METAL LAYERS;

MICROSTRUCTURE; PLASMA ETCHING; SILICON; SILICON WAFERS;

NATURAL FREQUENCIES;

EID: 84878152061     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/23/2/025026     Document Type: Article

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