Effect of CO on Ru nucleation and ultra-smooth thin film growth by chemical vapor deposition at low temperature

Chemistry of Materials

Volumn 25, Issue 9, 2013, Pages 1793-1799

  Liao, Wen ^a   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

carbon monoxide; chemical vapor deposition; metallic thin films; nucleation; triruthenium dodecacarbonyl

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); LOW TEMPERATURES; METALLIC THIN FILMS; NUCLEATION DENSITIES; PARTICLE DENSITIES; PRECURSOR ADSORPTION; RU NANOPARTICLES; TRIRUTHENIUM DODECACARBONYL;

ADSORPTION; CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; NUCLEATION; SUBSTRATES; THIN FILMS; VAPORS;

FILM GROWTH;

EID: 84877790607     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm400321j     Document Type: Article

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