High performance ultra-thin niobium films for superconducting hot-electron devices

IEEE Transactions on Applied Superconductivity

Volumn 23, Issue 3, 2013, Pages

  Jia, X Q ^a   Kang, L ^a   Liu, X Y ^a,b   Wang, Z H ^a   Jin, B B ^a   Mi, S B ^c   Chen, J ^a   Xu, W W ^a   Wu, P H ^a  

^a NANJING UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^c INSTITUTE OF METAL RESEARCH   (China)

Author keywords

High critical current density (JC); magnetron sputtering; niobium; superconducting ultra thin film

Indexed keywords

ALUMINUM NITRIDE (ALN); ELECTRONIC SPECTROSCOPY; HIGH CRITICAL CURRENT DENSITIES; HIGH RESISTIVITY SILICON; MGO SUBSTRATE; SAPPHIRE SUBSTRATES; SPUTTERING TARGET; STRUCTURAL CHARACTERIZATION;

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; ELECTRON DEVICES; MAGNESIA; MAGNETRON SPUTTERING; NIOBIUM; NIOBIUM OXIDE; OXIDE FILMS; SAPPHIRE; SUPERCONDUCTIVITY; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY DIFFRACTION;

SUPERCONDUCTING FILMS;

EID: 84877776970     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2012.2235508     Document Type: Article

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