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Volumn 519, Issue 6, 2011, Pages 1934-1942

Structural and surface property study of sputter deposited transparent conductive Nb-doped titanium oxide films

(5) Ishida, Takao a Okada, Masahisa b Tsuchiya, Tetsuo a Murakami, Takashi a Nakano, Miki a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Sputtering; Thin film; Titanium oxide; Transparent conducting oxides; Ultra violet photoelectron spectroscopy; Work function; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING IN VACUUM; ATOMIC FORCE MICROSCOPES; GRAIN SIZE; HIGH CONDUCTIVITY; HIGH DEPOSITION RATES; PEAK AREA; RF-MAGNETRON SPUTTERING; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT CONDUCTIVE; ULTRA-VIOLET LIGHT; X RAY PHOTOELECTRON SPECTRA;

CONDUCTIVE FILMS; GRAIN SIZE AND SHAPE; NIOBIUM; OXIDE FILMS; OXYGEN; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTONS; SURFACE PROPERTIES; THIN FILMS; TITANIUM; TITANIUM OXIDES; VAPOR DEPOSITION; WORK FUNCTION; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 78651245291 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.10.008 Document Type: Article

Times cited : (23)

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