Critical properties of submicrometer-patterned Nb thin film

IEEE Transactions on Applied Superconductivity

Volumn 19, Issue 3, 2009, Pages 2649-2652

  Kim, Yun Won ^a,b   Kahng, Yung Ho ^b   Choi, Jae Hyuk ^b   Lee, Soon Gul ^a  

^a Korea University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Jc; Nb film; Tc

Indexed keywords

CRITICAL PARAMETER; CRITICAL PROPERTIES; DC MAGNETRON SPUTTERING; E-BEAM LITHOGRAPHY; EDGE-BARRIER; FILM EDGE; JC; NB FILM; PROXIMITY EFFECTS; SI SUBSTRATES; SUBMICROMETERS; SUBMICRON; SUPERCONDUCTING ELECTRONIC DEVICES; SURFACE LAYERS; TC; TRANSITION TEMPERATURE;

MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; SUPERCONDUCTING DEVICES; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY; THIN FILMS; TRANSPORT PROPERTIES;

NIOBIUM;

EID: 68849108922     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2009.2019099     Document Type: Conference Paper

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