Electrostatic properties of few-layer MoS2 films

AIP Advances

Volumn 3, Issue 4, 2013, Pages

  Hao, Guolin ^a   Huang, Zongyu ^a   Liu, Yundan ^a   Qi, Xiang ^a   Ren, Long ^a   Peng, Xiangyang ^a   Yang, Liwen ^a   Wei, Xiaolin ^a   Zhong, Jianxin ^a  

^a XIANGTAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATIC DEVICES; ELECTROSTATICS; GRAIN BOUNDARIES; LAYERED SEMICONDUCTORS; MOLYBDENUM COMPOUNDS; SURFACE POTENTIAL;

DEFECT GRAINS; ELECTROSTATIC PROPERTIES; KELVIN PROBE FORCE MICROSCOPY;

SULFUR COMPOUNDS;

EID: 84877609250     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4802921     Document Type: Article

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