Work function engineering of graphene electrode via chemical doping

ACS Nano

Volumn 4, Issue 5, 2010, Pages 2689-2694

  Shi, Yumeng ^a,b   Kim, Ki Kang ^b   Reina, Alfonso ^c   Hofmann, Mario ^b   Li, Lain Jong ^d   Kong, Jing ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

^d RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

Author keywords

Doping; Graphene; Photovoltaic devices; Surface analysis

Indexed keywords

AU PARTICLES; CHEMICAL DOPING; CHEMICAL VAPOR DEPOSITION METHODS; IMMERSION TIME; MAXIMUM POWER; N TYPE SILICON; PHOTOVOLTAIC DEVICES; TRANSPARENT ELECTRODE;

CONVERSION EFFICIENCY; GOLD; GRAPHENE; GRAPHITE; GRAPHITE ELECTRODES; METAL IONS; PHOTOVOLTAIC EFFECTS; SURFACE ANALYSIS; SYNTHESIS (CHEMICAL); WORK FUNCTION;

CHEMICAL VAPOR DEPOSITION;

EID: 77952907880     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn1005478     Document Type: Article

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