Hot-wire chemical vapor deposition of WO3-x thin films of various oxygen contents

Materials Chemistry and Physics

Volumn 140, Issue 1, 2013, Pages 89-96

  Houweling, Z Silvester ^a   Geus, John W ^b   Schropp, Ruud E I ^a,c,d  

^a UTRECHT UNIVERSITY   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

^c Energy Research Centre of the Netherlands   (Netherlands)

^d EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Oxides Nanostructures Chemical vapour deposition (CVD) Rutherford backscattering spectroscopy (RBS)

Indexed keywords

ATOMIC COMPOSITIONS; CHEMICAL VAPOUR DEPOSITION; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; HOT WIRE CHEMICAL VAPOR DEPOSITION; INTERNAL MORPHOLOGY; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SUBSTRATE TEMPERATURE; TUNGSTEN FILAMENTS;

DEPOSITS; HYDROGEN; OXIDES; OXYGEN; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; ULTRATHIN FILMS; VAPORS; WIRE; X RAY DIFFRACTION;

CHEMICAL VAPOR DEPOSITION;

EID: 84877579829     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2013.02.072     Document Type: Article

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