Characterization of ozone sensors based on WO3 reactively sputtered films: Influence of O2 concentration in the sputtering gas, and working temperature

Sensors and Actuators, B: Chemical

Volumn 100, Issue 3, 2004, Pages 320-324

  Bendahan, M ^a   Boulmani, R ^a   Seguin, J L ^a   Aguir, K ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

Gas sensor; Ozone; Reactive sputtering; Thin films; WO3

Indexed keywords

ADSORPTION; ARGON; ELECTRODES; MORPHOLOGY; OZONE; PARTIAL PRESSURE; PLATINUM; SILICA; SILICON; SPUTTERING; THIN FILMS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ELECTRICAL RESPONSES; REACTIVE SPUTTERING; TURBO MOLECULAR PUMPS; WO3;

CHEMICAL SENSORS;

EID: 2342557923     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2004.01.023     Document Type: Article

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