Preparation of diamond films with controllable surface morphology, orientation and quality in an overmoded microwave plasma CVD chamber

Applied Surface Science

Volumn 276, Issue , 2013, Pages 529-534

  Weng, J ^a,b   Wang, J H ^a,b   Dai, S Y ^a   Xiong, L W ^b   Man, W D ^b   Liu, F ^b  

^a INSTITUTE OF PLASMA PHYSICS   (China)

^b WUHAN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Chemical vapor deposition; Diamond films; Orientation; Quality; Surface morphology

Indexed keywords

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILM PREPARATION; IMAGE QUALITY; MICROWAVES; MORPHOLOGY; PLASMA CVD; PLASMA DIAGNOSTICS; SUBSTRATES; SURFACE MORPHOLOGY;

CARBON CONCENTRATIONS; COUPLED EFFECT; MICROWAVE PLASMA CVD; OVERMODED; SUBSTRATE TEMPERATURE; TWO PARAMETER;

DIAMOND FILMS;

EID: 84877579567     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.03.128     Document Type: Article

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