Surface morphology, growth rate and quality of diamond films synthesized in hot filament CVD system under various methane concentrations

Applied Surface Science

Volumn 257, Issue 20, 2011, Pages 8420-8426

  Ali, M ^a   Urgen M ^b  

^a COMSATS Institute of Information Technology ^*  (Pakistan)

^b ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Chemical vapor deposition; Crystal structure; Cubic morphology; Grain growth; Thin films

Indexed keywords

CUBIC MORPHOLOGY; FILM MORPHOLOGY; GRAIN DENSITY; HIGH PURITY; HOT FILAMENT CVD; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; METHANE CONCENTRATIONS; METHYL RADICAL; PROPERTIES OF DEPOSITED FILMS; RAMAN STUDIES; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE;

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DIAMOND DEPOSITS; FILM GROWTH; GRAIN GROWTH; GROWTH RATE; METHANATION; METHANE; MORPHOLOGY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; SYNTHETIC DIAMONDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DIAMOND FILMS;

EID: 79959370383     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.04.097     Document Type: Article

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