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Volumn 20, Issue 4, 2011, Pages 480-484
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Design of novel plasma reactor for diamond film deposition
a
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Author keywords
Diamond film deposition; Electric field distribution; Numerical simulation; Plasma reactor
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Indexed keywords
DIAMOND FILM DEPOSITION;
ELECTRIC FIELD DISTRIBUTION;
HIGH DENSITY;
HIGH-QUALITY DIAMOND FILMS;
KEY FACTORS;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS;
MICROWAVE PLASMA REACTORS;
MICROWAVE POWER;
NUMERICAL SIMULATION;
PLASMA REACTOR;
PLASMA REACTORS;
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
DIAMONDS;
ELECTRIC FIELDS;
FINITE DIFFERENCE TIME DOMAIN METHOD;
FINITE ELEMENT METHOD;
MATHEMATICAL MODELS;
MICROWAVES;
PLASMA DENSITY;
PLASMA DEPOSITION;
PLASMAS;
DIAMOND FILMS;
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EID: 79952334802
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2011.01.046 Document Type: Article |
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Times cited : (28)
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References (16)
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