Scaling the microwave plasma-assisted chemical vapor diamond deposition process to 150-200 mm substrates

Diamond and Related Materials

Volumn 17, Issue 4-5, 2008, Pages 520-524

  King, D ^a   Yaran, M K ^a   Schuelke, T ^a   Grotjohn, T A ^a,b   Reinhard, D K ^a,b   Asmussen, J ^a,b  

^a Fraunhofer USA Inc   (United States)

^b Michigan State University   (United States)

Author keywords

Large area diamond synthesis; Microwave plasma assisted chemical vapor deposition; Polycrystalline diamond; Ultranano crystalline diamond

Indexed keywords

ARGON; CHEMICAL REACTORS; DIAMOND FILMS; LOW TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS;

LARGE AREA DIAMOND SYNTHESIS; MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE DIAMONDS; SCALING; ULTRANANO CRYSTALLINE DIAMONDS;

DIAMONDS;

EID: 43049102773     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2007.12.050     Document Type: Article

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