An economic CVD techniéue for pure SnO2 thin films deposition: Temperature effects

Bulletin of Materials Science

Volumn 36, Issue 2, 2013, Pages 217-221

  Maleki, M ^a   Rozati, S M ^a  

^a UNIVERSITY OF GUILAN   (Iran)

Author keywords

Air pressure CVD; SnO2 thin films; Substrate temperature

Indexed keywords

AIR PRESSURES; DEPOSITED FILMS; ELECTRICAL PARAMETER; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; SUBSTRATE TEMPERATURE; THIN FILMS DEPOSITION; UV-VISIBLE;

ATMOSPHERIC PRESSURE; DEPOSITS; ELECTRIC PROPERTIES; GRAIN SIZE AND SHAPE; OXIDE FILMS; SHEET RESISTANCE; THIN FILMS; TIN OXIDES; TRANSPARENCY; VAPOR DEPOSITION; X RAY DIFFRACTION;

SUBSTRATES;

EID: 84876964678     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-013-0460-5     Document Type: Article

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