Structural, optical and electrochemical properties of TiO 2 thin films grown by APCVD method

Applied Surface Science

Volumn 256, Issue 13, 2010, Pages 4065-4071

  Quinonez C ^a   Vallejo, W ^a   Gordillo, G ^a  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

Author keywords

APCVD; DSSC; Electrochemical properties; Optical properties; Structural properties

Indexed keywords

ATMOSPHERIC PRESSURE; CHARGE TRANSFER; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMICAL PROPERTIES; ELECTROLYTES; ITO GLASS; OPTICAL PROPERTIES; OXIDE MINERALS; STRUCTURAL PROPERTIES; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

APCVD; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHARGE TRANSFER RESISTANCE; COATED GLASS SUBSTRATES; DSSC; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY MEASUREMENTS; SPECTRAL TRANSMITTANCE; SYNTHESIS TEMPERATURES;

DYE-SENSITIZED SOLAR CELLS;

EID: 77950520264     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.020     Document Type: Review

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