Nanomechanical characteristics of SnO 2 :F thin films deposited by chemical vapor deposition

Applied Surface Science

Volumn 252, Issue 5, 2005, Pages 1863-1869

  Fang, Te Hua ^a   Chang, Win Jin ^b  

^a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Nanoindentation; Thin films; Tin oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; MICROSTRUCTURE; MORPHOLOGY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FREON FLOW RATES; NANOINDENTATION; TIN OXIDE;

TIN COMPOUNDS;

EID: 27944463158     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.151     Document Type: Article

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