Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD

Materials Science and Engineering: B

Volumn 159-160, Issue C, 2009, Pages 6-9

  Dagkaldiran, Ü ^a   Gordijn, A ^a   Finger, F ^a   Yates, H M ^b   Evans, P ^b   Sheel, D W ^b,c   Remes, Z ^d   Vanecek, M ^d  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b UNIVERSITY OF SALFORD   (United Kingdom)

^c CVD Technologies Ltd   (United Kingdom)

^d INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

APCVD; PECVD; Solar cells; TCO

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; GLASS; SILICON SOLAR CELLS;

AMORPHOUS SILICON SOLAR CELLS; APCVD; ATMOSPHERIC PRESSURE CVD; DEPOSITION PROCESS; EXTERNAL QUANTUM EFFICIENCY; INDUSTRIAL REQUIREMENTS; PROCESS SPEED; TRANSPARENT CONDUCTIVE OXIDE FILMS; TRANSPARENT CONDUCTIVE OXIDES; UPSCALING;

EFFICIENCY;

EID: 67349201683     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.10.037     Document Type: Article

References (3)

1. van den Donker M.N., Gordijn A., Stiebig H., Finger F., Rech B., Stannowski B., Bartl R., Hamers E.A.G., Schlatmann R., and Jongerden G.J. Sol. Energy Mater. Sol. Cells 91 (2007) 572-580
2. Sheel D.W., Evans P., and Pemble M.E. Chem. Mater. 18 24 (2006) 5750-5755
3. Yates H.M., Evans P., Sheel D.W., Dagkaldiran U., Gordijn A., Finger F., Remes Z., and Vanecek M. Proceedings of the PVSAT4. Bath, April (2008)